Resistive memory device with meshed electrodes

ABSTRACT

A method is presented for incorporating a resistive random access memory (RRAM) stack within a resistive memory crossbar array. The method includes forming a conductive line within an interlayer dielectric (ILD), constructing a barrier layer over a portion of the conductive line, forming a bottom meshed electrode, depositing a dielectric layer over the bottom meshed electrode, and forming a top meshed electrode over the dielectric layer, where each of the top and bottom meshed electrodes includes a plurality of isolations films.

BACKGROUND Technical Field

The present invention relates generally to semiconductor devices, andmore specifically, to a resistive memory device with meshed electrodes.

Description of the Related Art

Resistive random access memory (RRAM) is considered a promisingtechnology for electronic synapse devices or memristors for neuromorphiccomputing as well as high-density and high-speed non-volatile memoryapplications. In neuromorphic computing applications, a resistive memorydevice can be employed as a connection (synapse) between a pre-neuronand post-neuron, representing the connection weight in the form ofdevice resistance. Multiple pre-neurons and post-neurons can beconnected through a crossbar array of RRAMs, which can express afully-connected neural network configuration.

SUMMARY

In accordance with an embodiment, a method is provided for incorporatinga resistive random access memory (RRAM) stack within a resistive memorycrossbar array. The method includes forming a conductive line within aninterlayer dielectric (ILD), constructing a barrier layer over a portionof the conductive line, forming a bottom meshed electrode, depositing adielectric layer over the bottom meshed electrode, and forming a topmeshed electrode over the dielectric layer, where each of the top andbottom meshed electrodes includes a plurality of isolations films.

In accordance with another embodiment, a method is provided forincorporating a resistive random access memory (RRAM) stack within aresistive memory crossbar array. The method includes forming aconductive line within an interlayer dielectric (ILD), forming the RRAMstack over the conductive line, the RRAM stack constructed by forming abottom meshed electrode, depositing a dielectric layer over the bottommeshed electrode, and forming a top meshed electrode over the dielectriclayer, where each of the top and bottom meshed electrodes includes aplurality of isolations films.

In accordance with yet another embodiment, a semiconductor device isprovided for incorporating a resistive random access memory (RRAM) stackwithin a resistive memory crossbar array. The semiconductor deviceincludes a conductive line constructed within an interlayer dielectric(ILD), a barrier layer disposed over a portion of the conductive line, abottom meshed electrode, a dielectric layer disposed over the bottommeshed electrode, and a top meshed electrode disposed over thedielectric layer, where each of the top and bottom meshed electrodesincludes a plurality of isolations films.

It should be noted that the exemplary embodiments are described withreference to different subject-matters. In particular, some embodimentsare described with reference to method type claims whereas otherembodiments have been described with reference to apparatus type claims.However, a person skilled in the art will gather from the above and thefollowing description that, unless otherwise notified, in addition toany combination of features belonging to one type of subject-matter,also any combination between features relating to differentsubject-matters, in particular, between features of the method typeclaims, and features of the apparatus type claims, is considered as tobe described within this document.

These and other features and advantages will become apparent from thefollowing detailed description of illustrative embodiments thereof,which is to be read in connection with the accompanying drawings.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The invention will provide details in the following description ofpreferred embodiments with reference to the following figures wherein:

FIG. 1 is a cross-sectional view of a semiconductor structure includinga conductive line formed within a dielectric layer, where a cappinglayer is formed over the conductive line, in accordance with anembodiment of the present invention;

FIG. 2 is a cross-sectional view of the semiconductor structure of FIG.1 where the capping layer is etched to expose a top surface of theconductive line, in accordance with an embodiment of the presentinvention;

FIG. 3 is a cross-sectional view of the semiconductor structure of FIG.2 where a barrier layer is deposited over the conductive line, inaccordance with an embodiment of the present invention;

FIG. 4 is a cross-sectional view of the semiconductor structure of FIG.3 where the barrier layer is planarized such that it is flush with theremaining capping layer, in accordance with an embodiment of the presentinvention;

FIG. 5 is a cross-sectional view of the semiconductor structure of FIG.4 where a metal layer is patterned on the conductive line, in accordancewith an embodiment of the present invention;

FIG. 6 is a cross-sectional view of the semiconductor structure of FIG.5 where trenches formed by the patterned metal layer are filled with anisolation film, in accordance with an embodiment of the presentinvention;

FIG. 7 is a cross-sectional view of the semiconductor structure of FIG.4 where isolation layers are patterned on the conductive line, inaccordance with another embodiment of the present invention;

FIG. 8 is a cross-sectional view of the semiconductor structure of FIG.7 where trenches formed by the patterned isolation film are filled witha metal, in accordance with an embodiment of the present invention;

FIG. 9 is a cross-sectional view of the semiconductor structure of FIG.6 or FIG. 8 where a metal oxide is deposited, in accordance with anembodiment of the present invention;

FIG. 10 is a cross-sectional view of the semiconductor structure of FIG.9 where a meshed top electrode is formed with isolation layers, inaccordance with an embodiment of the present invention;

FIG. 11 is a cross-sectional view of the semiconductor structure of FIG.10 where a metal layer and a hardmask layer are deposited, in accordancewith an embodiment of the present invention;

FIG. 12 is a cross-sectional view of the semiconductor structure of FIG.11 where the metal layer and the hardmask layer are patterned, inaccordance with an embodiment of the present invention;

FIG. 13 is a cross-sectional view of the semiconductor structure of FIG.12 where etching is performed to create a resistive random access memory(RRAM) stack, in accordance with an embodiment of the present invention;

FIG. 14 is a cross-sectional view of the semiconductor structure of FIG.13 where spacers are formed adjacent the RRAM stack, in accordance withan embodiment of the present invention; and

FIG. 15 is a top view of the meshed electrodes in a cross-bar arrayconfiguration, in accordance with an embodiment of the presentinvention.

Throughout the drawings, same or similar reference numerals representthe same or similar elements.

DETAILED DESCRIPTION

Embodiments in accordance with the present invention provide methods anddevices for constructing resistive random access memory (RRAM) deviceswith meshed top and bottom electrodes. The RRAMs can be employed forelectronic synapse devices or memristors for neuromorphic computing aswell as high-density and high-speed non-volatile memory applications. Inneuromorphic computing applications, a resistive memory device can beemployed as a connection (synapse) between a pre-neuron and post-neuron,representing a connection weight in the form of device resistance.Multiple pre-neurons and post-neurons can be connected through acrossbar array of RRAMs, which can be configured as a fully-connectedneural network. Large scale integration of large RRAM arrays withcomplementary metal oxide semiconductor (CMOS) circuits can enablescaling of RRAM devices down to 10 nm and beyond for neuromorphiccomputing as well as high-density and high-speed non-volatile memoryapplications.

Embodiments in accordance with the present invention provide methods anddevices for constructing a crossbar array structure with meshed top andbottom electrodes. Variability of switching characteristics is a concernfor filament-type RRAM devices in general. The variability is partly dueto a limited number of filaments. This prevents enablement of largercross bar array structures. The exemplary embodiments of the presentinvention reduce variability of switching characteristics by takingadvantage of averaging effect for filaments connected in parallel. Thisis achieved by introducing meshed electrodes with high resistivity toform multiple localized filaments. The meshed electrodes are connectedto shared electrodes to make parallel connection of filaments. Thus,multiple top electrode connections can be formed within the same cell,where such configuration should average out stochastic components ofswitching and improve variability.

It is to be understood that the present invention will be described interms of a given illustrative architecture; however, otherarchitectures, structures, substrate materials and process features andsteps/blocks can be varied within the scope of the present invention. Itshould be noted that certain features cannot be shown in all figures forthe sake of clarity. This is not intended to be interpreted as alimitation of any particular embodiment, or illustration, or scope ofthe claims.

FIG. 1 is a cross-sectional view of a semiconductor structure includinga conductive line formed within a dielectric layer, where a cappinglayer is formed over the conductive line, in accordance with anembodiment of the present invention.

A semiconductor structure 5 includes a conductive line 12 formed withinan inter-layer dielectric (ILD) 10. A capping layer or etch stop layer14 can be formed over the conductive line 12, as well as the ILD 10.

The ILD 10 can include any materials known in the art, such as, forexample, porous silicates, carbon doped oxides, silicon dioxides,silicon nitrides, silicon oxynitrides, or other dielectric materials.The ILD 10 can be formed using any method known in the art, such as, forexample, chemical vapor deposition, plasma enhanced chemical vapordeposition, atomic layer deposition, or physical vapor deposition. TheILD 10 can have a thickness ranging from about 25 nm to about 200 nm.

The dielectric material of layer 10 can include, but is not limited to,ultra-low-k (ULK) materials, such as, for example, porous silicates,carbon doped oxides, silicon dioxides, silicon nitrides, siliconoxynitrides, carbon-doped silicon oxide (SiCOH) and porous variantsthereof, silsesquioxanes, siloxanes, or other dielectric materialshaving, for example, a dielectric constant in the range of about 2 toabout 4.

The metal line 12 can be formed in an opening or trench in the ILD 10.The metal line 12 can be any conductive material known in the art, suchas, for example, copper (Cu), aluminum (Al), or tungsten (W). The metalline 12 can be fabricated using any technique known in the art, such as,for example, a single or dual damascene technique. In an embodiment, notillustrated, the metal line 12 can be copper (Cu) and can include ametal liner, where a metal liner can be metals, such as, for example,tantalum nitride and tantalum (TaN/Ta), titanium, titanium nitride,cobalt, ruthenium, and manganese.

The dielectric cap or dielectric capping layer or etch stop layer 14 canbe referred to as a barrier layer or dielectric barrier layer. Thedielectric material of the dielectric cap 14 can be silicon nitride(SiN), etc. In one embodiment, the etch stop layer 14 is NBLOK.

FIG. 2 is a cross-sectional view of the semiconductor structure of FIG.1 where the capping layer is etched to expose a top surface of theconductive line, in accordance with an embodiment of the presentinvention.

In various example embodiments, a portion of the dielectric cap 14 isetched or removed to form opening 16. The etching of the dielectric cap14 results in the exposure of a portion of a top surface 13 of theconductive line 12.

FIG. 3 is a cross-sectional view of the semiconductor structure of FIG.2 where a barrier layer is deposited over the conductive line, inaccordance with an embodiment of the present invention.

In various example embodiments, a metal nitride liner 18 is depositedover the exposed top surface of the conductive line 12, as well as overremaining portions of the dielectric cap 14. In an embodiment, the metalnitride liner 18 can be, e.g., a tantalum nitride (TaN) layer.

FIG. 4 is a cross-sectional view of the semiconductor structure of FIG.3 where the barrier layer is planarized such that it is flush with theremaining capping layer, in accordance with an embodiment of the presentinvention.

In various example embodiments, the metal nitride liner 18 is planarizedby, e.g., CMP such that a metal nitride layer 20 is formed over theconductive line 12. The top surface of the metal nitride layer 20 isflush with a top surface of the remaining dielectric cap portions 14.The metal nitride layer 20 can be referred to as a barrier layer formedover and in direct contact with the conductive line 12.

FIG. 5 is a cross-sectional view of the semiconductor structure of FIG.4 where a metal layer is patterned on the conductive line, in accordancewith an embodiment of the present invention.

In various example embodiments, a metal layer 22 is patterned over theconductive line 12. The metal layer 22 includes openings 21. The metallayer 22 can be, e.g., a titanium oxynitride (TiON) layer. The metallayer 22 can be patterned by employing lithography and reactive ionetching (RIE) techniques.

The titanium oxynitride material in the titanium oxynitride layer 22 hasa composition of TiO_(x)N_(y), in which x can be in a range from about0.1 to about 1.9, and y can be in a range from about 0.05 to about 0.95,and (1−x)+2y can be in a range from about 0.9 to about 2.4.

The titanium oxynitride material 22 is more easily removed compared totitanium nitride material by various wet etch chemistries. For example,a wet etch chemistry employing dilute hydrofluoric acid or a combinationof hydrogen peroxide and trans-1,2-cyclohexanediaminetetraacetic acid(CDTA) can remove titanium oxynitride at an etch rate that is at leastan order of magnitude greater than the etch rate of titanium nitride bythe same wet etch chemistry. Portions of the titanium oxynitridematerial 22 are removed later on in the manufacturing process whenforming the RRAM stack (FIG. 13).

FIG. 6 is a cross-sectional view of the semiconductor structure of FIG.5 where trenches formed by the patterned metal layer are filled with anisolation film, in accordance with an embodiment of the presentinvention.

In various example embodiments, the openings 21 of the metal layer 22can be filled with an isolation film 24 (or insulator segments 24). Theisolation film 24 can be, e.g., silicon nitride (SiN). The isolationfilm 24 can be planarized. The planarization process can be provided byCMP. Other planarization process can include grinding and polishing. Theisolation film 24 is a plurality of isolation films 24 that run parallelto each other.

FIG. 7 is a cross-sectional view of the semiconductor structure of FIG.4 where isolation layers are patterned on the conductive line, inaccordance with another embodiment of the present invention.

In various example embodiments, instead of forming the metal layer 22first, the isolation film 24 is first formed. The isolation film 24 isformed over and in direct contact with the metal nitride layer 20. Theisolation film 24 can be patterned by employing lithography and reactiveion etching (RIE) techniques.

FIG. 8 is a cross-sectional view of the semiconductor structure of FIG.7 where trenches formed by the patterned isolation film are filled witha metal, in accordance with an embodiment of the present invention.

In various example embodiments, once the isolation film 24 has beenformed, the trenches can be filled with the metal layer 22. The metallayer 22 can be planarized. The planarization process can be provided byCMP. Other planarization process can include grinding and polishing.

In FIGS. 6 and 8, the TiON 22 and the plurality of isolation films 24can define a bottom electrode of a resistive random access memory (RRAM)device. This can be referred to as a meshed bottom electrode 25.

The bottom electrode can include a conductive material, such as Cu, Al,Ag, Au, Pt, W, etc. In some embodiments, the bottom electrode caninclude nitrides such as TiN, TaN, Ta or Ru. In a preferred embodiment,the bottom electrode 25 includes TiON meshed with a plurality of SiNfilms.

FIG. 9 is a cross-sectional view of the semiconductor structure of FIG.6 or FIG. 8 where a metal oxide is deposited, in accordance with anembodiment of the present invention.

In various example embodiments, a metal oxide layer 30 can be deposited.The metal oxide layer 30 can be a hafnium oxide (HfO) layer. However,the metal oxide layer 30 can be any type of high-k dielectric layer,such as, but not limited to, HfO₂, HfSiO, HfSiON, HfZrO, Ta₂O₅, ZrO₂,TiO₂, La₂O₃, Y₂O₃, Al₂O₃, and mixtures thereof.

FIG. 10 is a cross-sectional view of the semiconductor structure of FIG.9 where a meshed top electrode is formed with isolation layers, inaccordance with an embodiment of the present invention.

In various example embodiments, a metal layer 32 can be formed. Themetal layer 32 can be patterned such that trenches are formed thereon.The metal layer 32 can be, e.g., a titanium oxynitride (TiON) layer. Thetrenches are filled with an isolation film 34 (or insulator segments34). The isolation film 34 can be, e.g., SiN. The TiON 32 and theisolation films 34 can define a top electrode of a resistive randomaccess memory (RRAM) device. This can be referred to as a meshed topelectrode 35.

Isolation films 34 are offset from the isolation films 24. In across-sectional configuration, the isolation films 34 are shown to beparallel to the isolation films 24. However, in a top view (FIG. 15) andin 3D views, the isolation films 34 are actually perpendicular to theisolation films 24. Thus, the plurality of isolation films 24 runparallel to each other and perpendicular to the plurality of isolationfilms 34.

The top electrode can include a conductive material, such as Cu, Al, Ag,Au, Pt, W, etc. In some embodiments, the top electrode can includenitrides such as TiN, TaN, Ta or Ru. In a preferred embodiment, the topelectrode 35 includes TiON meshed with SiN films. Thus, both the top andbottom electrodes 25, 35 can be, e.g., TiON meshed with SiN films. Inother words, the top and bottom electrodes 25, 35 are formed from thesame material.

FIG. 11 is a cross-sectional view of the semiconductor structure of FIG.10 where a metal layer and a hardmask layer are deposited, in accordancewith an embodiment of the present invention.

In various example embodiments, a metal layer 36 and a hardmask layer 38are formed. The metal layer 36 can be, e.g., a tantalum nitride (TaN)layer.

In various embodiments, the hardmask layer 38 can be a nitride, forexample, a silicon nitride (SiN), an oxynitride, for example, siliconoxynitride (SiON), or a combination thereof. In a preferred embodiment,the hardmask layer 38 can be silicon nitride (SiN), for example, Si₃N₄.

In one or more embodiments, the hardmask layer 38 can have a thicknessin the range of about 20 nm to about 100 nm, or in the range of about 35nm to about 75 nm, or in the range of about 45 nm to about 55 nm,although other thicknesses are contemplated.

FIG. 12 is a cross-sectional view of the semiconductor structure of FIG.11 where the metal layer and the hardmask layer are patterned, inaccordance with an embodiment of the present invention.

In various embodiments, the hardmask layer 38 and the metal layer 36 areetched by, e.g., RIE, to form remaining hardmask layer 38′ and remainingmetal layer 36′. The etching results in the exposure of a top surface ofthe top meshed electrode 35.

FIG. 13 is a cross-sectional view of the semiconductor structure of FIG.12 where etching is performed to create a resistive random access memory(RRAM) stack, in accordance with an embodiment of the present invention.

In various example embodiments, etching takes place to form a RRAM stack42. The etching results in openings 40 adjacent the RRAM stack 42. A topsurface 15 of the remaining dielectric capping layer 14 is also exposed.The RRAM stack 42 thus includes a meshed bottom electrode 25, a hafniumoxide (HfO) layer, and a meshed top electrode 35. Additionally, a metallayer 36′ and a hardmask 38′ are part of the RRAM stack 42.

FIG. 14 is a cross-sectional view of the semiconductor structure of FIG.13 where spacers are formed adjacent the RRAM stack, in accordance withan embodiment of the present invention.

In various example embodiments, spacers 44 are formed adjacent the RRAMstack 42.

The spacers 44 can be formed by performing a deposition process, forexample, a chemical vapor deposition process (CVD), followed by adirectional etch process (e.g., reactive ion etch (RIE) to remove thespacer material from horizontal surfaces. The spacers 44 can include onelayer or multiple layers of materials. For example, the spacers 44 caninclude silicon nitride (SiN), silicon carbide (SiC), silicon oxynitride(SiON), carbon-doped silicon oxide (SiOC), silicon-carbon-nitride(SiCN), boron nitride (BN), silicon boron nitride (SiBN), silicoboroncarbonitride (SiBCN), silicon oxycabonitride (SiOCN), and combinationsthereof.

The thickness of the spacers 44 can generally vary and is not intendedto be limited. In some embodiments, the thickness of the spacers 44 isin a range from about 3 to about 50 nm. In other embodiments, thethickness of the spacers 44 is in a range from about 10 to about 30 nm.

FIG. 15 is a top view of the meshed electrodes in a cross-bar arrayconfiguration, in accordance with an embodiment of the presentinvention.

In various example embodiments, the top electrodes 35 are perpendicularto the bottom electrodes 25 to form a crosspoint or crossbar array 50.Thus, the meshed isolation films 24 of the bottom electrodes 25 are alsoperpendicular to the meshed isolation films 34 of the top electrodes 35.Thus, the isolation films 24 of the bottom electrode are shownperpendicular to the isolation films 34 of the top electrode. Theisolation films 24 are separated from the isolation films 34 by metaloxide layer 30.

In various example embodiments, the conductive line 12 can be, forexample, a metal or doped polysilicon (poly-Si). Non-limiting examplesof metals include copper (Cu), cobalt (Co), aluminum (Al), platinum(Pt), gold (Au), tungsten (W), titanium (Ti), or any combinationthereof. The metal line 12 can be deposited by a suitable depositionprocess, for example, chemical vapor deposition (CVD), plasma enhancedchemical vapor deposition (PECVD), physical vapor deposition (PVD),plating, thermal or e-beam evaporation, or sputtering.

As used throughout the instant application, the term “copper” isintended to include substantially pure elemental copper, copperincluding unavoidable impurities including a native oxide, and copperalloys including one or more additional elements such as carbon,nitrogen, magnesium, aluminum, titanium, vanadium, chromium, manganese,nickel, zinc, germanium, strontium, zirconium, silver, indium, tin,tantalum, and platinum. In embodiments, the copper alloy is acopper-manganese alloy. In further embodiments, in lieu of copper,cobalt metal (Co) or cobalt metal alloys can be employed. Thecopper-containing structures are electrically conductive. “Electricallyconductive” as used through the present disclosure refers to a materialhaving a room temperature conductivity of at least 10⁻⁸ (Ω−m)⁻¹.

In conclusion, the exemplary embodiments of the present invention employmeshed electrodes (e.g., TiON with SiN isolation regions) connected tocommon electrodes (e.g., TaN) for both top and bottom electrodes to formone unit cell. The unit cell is electrically divided into smallersub-cells connected in parallel. Since all the sub-cells share the sameHfO2 layer, it facilitates formation of an identical filament in eachsub-cell. A highly resistive metal (e.g., TiON) can be employed asmeshed electrodes to localize the filament growth. The measured deviceresistance is from a parallel connection of many identical filaments.This configuration should average out stochastic components of switchingand improve variability.

Thus, a single memory unit cell with meshed electrodes is presented,connected in parallel with common electrodes. The meshed electrodes havehigh resistivity to localize filament formation (e.g., TiON) andinsulator segments are embedded in both the top and bottom electrodes.The orientation of the embedded insulator segments in top and bottomelectrodes are perpendicular to each other. Moreover, the steps ofconstructing the semiconductor structure include patterning metalelectrodes and refilling with insulator segments, patterning theinsulator segments and refilling with electrode material, patterning astacked metal-insulator-metal thin film, which includes the insulatorsegments in the metal, and encapsulating the structure with anotherinsulator or insulator segments. As a result, the exemplary embodimentsof the present invention include multiple smaller sized electrodeswithin each cell to localize filament formation. Stated differently,multiple top electrode connections are formed within the same cell.

The exemplary embodiments reduce variability of switchingcharacteristics by taking advantage of averaging effect for filamentsconnected in parallel. This is achieved by introducing meshed electrodeswith high resistivity to form multiple localized filaments. The meshedelectrodes are connected to shared electrodes to make parallelconnection of filaments. The change in the configuration of the filamentin response to electrical signals has a probabilistic nature and itmanifests as variability and stochasticity in switching behaviors.

It is to be understood that the present invention will be described interms of a given illustrative architecture; however, otherarchitectures, structures, substrate materials and process features andsteps/blocks can be varied within the scope of the present invention.

It will also be understood that when an element such as a layer, regionor substrate is referred to as being “on” or “over” another element, itcan be directly on the other element or intervening elements can also bepresent. In contrast, when an element is referred to as being “directlyon” or “directly over” another element, there are no interveningelements present. It will also be understood that when an element isreferred to as being “connected” or “coupled” to another element, it canbe directly connected or coupled to the other element or interveningelements can be present. In contrast, when an element is referred to asbeing “directly connected” or “directly coupled” to another element,there are no intervening elements present.

The present embodiments can include a design for an integrated circuitchip, which can be created in a graphical computer programming language,and stored in a computer storage medium (such as a disk, tape, physicalhard drive, or virtual hard drive such as in a storage access network).If the designer does not fabricate chips or the photolithographic masksused to fabricate chips, the designer can transmit the resulting designby physical mechanisms (e.g., by providing a copy of the storage mediumstoring the design) or electronically (e.g., through the Internet) tosuch entities, directly or indirectly. The stored design is thenconverted into the appropriate format (e.g., GDSII) for the fabricationof photolithographic masks, which include multiple copies of the chipdesign in question that are to be formed on a wafer. Thephotolithographic masks are utilized to define areas of the wafer to beetched or otherwise processed.

Methods as described herein can be used in the fabrication of integratedcircuit chips. The resulting integrated circuit chips can be distributedby the fabricator in raw wafer form (that is, as a single wafer that hasmultiple unpackaged chips), as a bare die, or in a packaged form. In thelatter case, the chip is mounted in a single chip package (such as aplastic carrier, with leads that are affixed to a motherboard or otherhigher level carrier) or in a multichip package (such as a ceramiccarrier that has either or both surface interconnections or buriedinterconnections). In any case, the chip is then integrated with otherchips, discrete circuit elements, and/or other signal processing devicesas part of either (a) an intermediate product, such as a motherboard, or(b) an end product. The end product can be any product that includesintegrated circuit chips, ranging from toys and other low-endapplications to advanced computer products having a display, a keyboardor other input device, and a central processor.

It should also be understood that material compounds will be describedin terms of listed elements, e.g., SiGe. These compounds includedifferent proportions of the elements within the compound, e.g., SiGeincludes Si_(x)Ge_(1−x) where x is less than or equal to 1, etc. Inaddition, other elements can be included in the compound and stillfunction in accordance with the present embodiments. The compounds withadditional elements will be referred to herein as alloys. Reference inthe specification to “one embodiment” or “an embodiment” of the presentinvention, as well as other variations thereof, means that a particularfeature, structure, characteristic, and so forth described in connectionwith the embodiment is included in at least one embodiment of thepresent invention. Thus, the appearances of the phrase “in oneembodiment” or “in an embodiment”, as well any other variations,appearing in various places throughout the specification are notnecessarily all referring to the same embodiment.

It is to be appreciated that the use of any of the following “/”,“and/or”, and “at least one of”, for example, in the cases of “A/B”, “Aand/or B” and “at least one of A and B”, is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of both options (A andB). As a further example, in the cases of “A, B, and/or C” and “at leastone of A, B, and C”, such phrasing is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of the third listedoption (C) only, or the selection of the first and the second listedoptions (A and B) only, or the selection of the first and third listedoptions (A and C) only, or the selection of the second and third listedoptions (B and C) only, or the selection of all three options (A and Band C). This can be extended, as readily apparent by one of ordinaryskill in this and related arts, for as many items listed.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of exampleembodiments. As used herein, the singular forms “a,” “an” and “the” areintended to include the plural forms as well, unless the context clearlyindicates otherwise. It will be further understood that the terms“comprises,” “comprising,” “includes” and/or “including,” when usedherein, specify the presence of stated features, integers, steps,operations, elements and/or components, but do not preclude the presenceor addition of one or more other features, integers, steps, operations,elements, components and/or groups thereof.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper,” and the like, can be used herein for ease of description todescribe one element's or feature's relationship to another element(s)or feature(s) as illustrated in the FIGS. It will be understood that thespatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the FIGS. For example, if the device in theFIGS. is turned over, elements described as “below” or “beneath” otherelements or features would then be oriented “above” the other elementsor features. Thus, the term “below” can encompass both an orientation ofabove and below. The device can be otherwise oriented (rotated 90degrees or at other orientations), and the spatially relativedescriptors used herein can be interpreted accordingly. In addition, itwill also be understood that when a layer is referred to as being“between” two layers, it can be the only layer between the two layers,or one or more intervening layers can also be present.

It will be understood that, although the terms first, second, etc. canbe used herein to describe various elements, these elements should notbe limited by these terms. These terms are only used to distinguish oneelement from another element. Thus, a first element discussed belowcould be termed a second element without departing from the scope of thepresent concept.

Having described preferred embodiments of a method for employing aresistive memory device with meshed electrodes (which are intended to beillustrative and not limiting), it is noted that modifications andvariations can be made by persons skilled in the art in light of theabove teachings. It is therefore to be understood that changes may bemade in the particular embodiments described which are within the scopeof the invention as outlined by the appended claims. Having thusdescribed aspects of the invention, with the details and particularityrequired by the patent laws, what is claimed and desired protected byLetters Patent is set forth in the appended claims.

What is claimed is:
 1. A method for incorporating a resistive randomaccess memory (RRAM) stack within a resistive memory crossbar array, themethod comprising: forming a bottom meshed electrode; depositing adielectric layer over the bottom meshed electrode; and forming a topmeshed electrode over the dielectric layer, wherein the bottom meshedelectrode includes a plurality of first isolations films.
 2. The methodof claim 1, further comprising forming a conductive line within aninterlayer dielectric (ILD).
 3. The method of claim 2, furthercomprising constructing a barrier layer over a portion of the conductiveline.
 4. The method of claim 3, wherein the top meshed electrodeincludes a plurality of second isolation films.
 5. The method of claim4, wherein the plurality of first and second isolation films are formedfrom silicon nitride (SiN).
 6. The method of claim 5, wherein theplurality of first isolation films of the bottom meshed electrode areperpendicular to the plurality of second isolation films of the topmeshed electrode.
 7. The method of claim 1, further comprising forming ametal layer over the top meshed electrode.
 8. The method of claim 7,further comprising forming a hardmask over the metal layer.
 9. Themethod of claim 8, wherein the bottom meshed electrode, the dielectriclayer, the top meshed electrode, the metal layer, and the hardmaskdefine the RRAM stack.
 10. The method of claim 9, further comprisingforming spacers adjacent the RRAM stack.
 11. The method of claim 1,wherein the top and bottom meshed electrodes are formed from a samematerial.
 12. The method of claim 11, wherein the same material istitanium oxynitride (TiON).
 13. A method for incorporating a resistiverandom access memory (RRAM) stack within a resistive memory crossbararray, the method comprising: forming the RRAM stack over the conductiveline, the RRAM stack constructed by: forming a bottom meshed electrode;depositing a dielectric layer over the bottom meshed electrode; andforming a top meshed electrode over the dielectric layer, wherein thebottom meshed electrode includes a plurality of first isolations films.14. The method of claim 13, wherein the top meshed electrode includes aplurality of second isolation films.
 15. The method of claim 14, whereinthe RRAM stack further includes a metal layer over the top meshedelectrode.
 16. The method of claim 15, wherein the RRAM stack furtherincludes a hardmask over the metal layer.
 17. The method of claim 16,further comprising forming spacers adjacent the RRAM stack.
 18. Themethod of claim 17, wherein the top and bottom meshed electrodes areformed from a same material.
 19. The method of claim 18, wherein theplurality of first and second isolation films are formed from siliconnitride (SiN).
 20. The method of claim 19, wherein the plurality offirst isolation films of the bottom meshed electrode are perpendicularto the plurality of second isolation films of the top meshed electrode.